Semiconductor Manufacturer: Prototyping and Manufacturing Facilities, USA and Ireland. 1996 – 2005.
Senior Architect for CH2M Hill
The planning and detail design of the ISO 3 manufacturing cleanroom, ISO 6 clean laboratories and support spaces. The projects varied in size from 2,000 m² to 30,000 m².
The design of analytical laboratories with critical environments including metrology and characterisation laboratories. These housed a range of equipment including: Scanning Electron Microscopes, Transmission Electron Microscopes, Focused Ion Beam tools, Atomic Force Microscopes, Secondary Ion Mass Spectroscopes and X-Ray Photoelectron Spectroscopes